Static development type (paddle) automatic photoresist development device (developer)
We have a proven track record with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.
The development is performed by pooling the developer solution on the wafer in a batch process. Unlike the dip method, each wafer is developed individually, resulting in very high reproducibility of the process. By optimizing the amount of chemical used, it leads to a reduction in the amount of developer solution used. We can accommodate requests for pooling methods, from shower types to straight nozzles. It also features a shaking function during static development! (It moves the liquid by repeating low rotation and stopping.) The batch process includes development, rinsing, baking, and cooling functions. We design, manufacture, and sell according to customer needs and production volumes. We have a proven track record with various chemicals, including TMAH. 【Features】 ■ High reproducibility of development results ■ Reduction in chemical usage ■ Automatic wafer size recognition ■ Proven track record with various chemicals ■ Reduced footprint ■ Design tailored to production volume We have a permanent demo setup, so please consider a demonstration!
- Company：エイ・エス・エイ・ピイ
- Price：Other
